- Spectroscopic ellipsometrer (GES5 spectroscopic-ellipsometer SEMILAB)
- Near Field Optical Microscope (NeaSNOM)
- Near Field Optical Microscope (NeaSNOM)
- Atomic Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments)
- Near Field Optical Microscope (NeaSNOM)
- Atomic Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments)
- Spectroscopic ellipsometrer (GES5 spectroscopic-ellipsometer SEMILAB)
- Near Field Optical Microscope (NeaSNOM)
- Near Field Optical Microscope (NeaSNOM)
- Near Field Optical Microscope (NeaSNOM)
- Atomic Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments)
- Atomic Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments)
- Spectroscopic ellipsometrer (GES5 spectroscopic-ellipsometer SEMILAB)
- Spectroscopic ellipsometrer (GES5 spectroscopic-ellipsometer SEMILAB)
- Spectroscopic ellipsometrer (GES5 spectroscopic-ellipsometer SEMILAB)
- Reactive ion etcher (RIE Oxford Plasmalab 80 Plus)
- Environmental Scanning electron Microscope (eSEM-FEI QuantaTM 250)
- Reactive ion etcher (RIE Oxford Plasmalab 80 Plus)
- High power industrial Picosecond Laser
- Mask aligner (EVG)
- High resolution transmission electron microscope (HRTEM)
- Reactive ion etcher (RIE Oxford Plasmalab 80 Plus)
- Mask aligner (EVG)
- Reactive ion etcher (RIE Oxford Plasmalab 80 Plus)
- Mask aligner (EVG)
- Dual beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S, Leica EM MED020 / Quorum technologies Q150 T ES
- Dual beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S, Leica EM MED020 / Quorum technologies Q150 T ES
- Quantum Design PPMS
- Dual beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S, Leica EM MED020 / Quorum technologies Q150 T ES
- Atomic Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments)
- Electron Beam Lithography (Raith -150-TWO / E-line)
- ATC series AJA Sputtering System
- Dual beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S, Leica EM MED020 / Quorum technologies Q150 T ES
- Dual beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S, Leica EM MED020 / Quorum technologies Q150 T ES
- Oerlikon - UNIVEX 350 / EPVD75 Kurt J. Lesker
- ALD Cambridge Nanotech Savannah S100
- ALD Cambridge Nanotech Savannah S100
- Electron Beam Lithography (Raith -150-TWO / E-line)
- X’Pert PRO PANalytical X-ray diffractometer
- X’Pert PRO PANalytical X-ray diffractometer
- Electron Beam Lithography (Raith -150-TWO / E-line)
- ATC series AJA Sputtering System
- X’Pert PRO PANalytical X-ray diffractometer
- Dual beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S, Leica EM MED020 / Quorum technologies Q150 T ES
- Dual beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S, Leica EM MED020 / Quorum technologies Q150 T ES
- ALD Cambridge Nanotech Savannah S100
- Dual beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S, Leica EM MED020 / Quorum technologies Q150 T ES
- Oerlikon - UNIVEX 350 / EPVD75 Kurt J. Lesker
- X’Pert PRO PANalytical X-ray diffractometer
- Quantum Design PPMS
- Dual beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S, Leica EM MED020 / Quorum technologies Q150 T ES
- ALD Cambridge Nanotech Savannah S100
