Lifting off a zen garden

SEM image taken after partial lift-off of Cr/Al on a silicon oxide substrate. Designed by electron beam lithography, each array is formed by ten ribbons, of width 75 nm and length 50 um. After the lithography, 5 nm of Cr and 50 of Al were deposited. To recover the structures, the sample is immersed in acetone. The structure was frozen during the process, resembling a brush painting a nano zen garden.

Image taken by Maria Barra Burillo.